Integrated circuit package and method of forming same

ABSTRACT

Various embodiments of an integrated circuit package and a method of forming such package are disclosed. The package includes a substrate having a core layer disposed between a first dielectric layer and a second dielectric layer, a die disposed in a cavity of the core layer, and an encapsulant disposed in the cavity between the die and a sidewall of the cavity. The package further includes a first patterned conductive layer disposed within the first dielectric layer, a device disposed on an outer surface of the first dielectric layer such that the first patterned conductive layer is between the device and the core layer, a second patterned conductive layer disposed within the second dielectric layer, and a conductive pad disposed on an outer surface of the second dielectric layer such that the second patterned conductive layer is between the conductive pad and the core layer.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application claims the benefit of U.S. Provisional Application Ser.No. 62/718,631, filed Aug. 14, 2018, the entire content of which isincorporated herein by reference.

BACKGROUND

A wide variety of electronic assemblies such as those that are utilizedfor implantable medical devices (IMDs) employ electronic circuitry,e.g., for providing electrical stimulation of body tissue and/ormonitoring a physiologic condition. Such IMDs may deliver electricaltherapy energy in the form of shocking energy and stimulating pulses toselected body tissue. These IMDs typically include output circuitry forgenerating the electrical energy under prescribed conditions and atleast one lead bearing a stimulation electrode for delivering theelectrical energy to the selected tissue. For example, cardiacpacemakers and implantable cardioverter-defibrillators (ICDs) have beendeveloped for maintaining a desired heart rate during episodes ofbradycardia or for applying cardioversion or defibrillation therapies tothe heart upon detection of serious arrhythmias. Other nerve, brain,muscle, and organ tissue stimulating medical devices are also known fortreating a variety of conditions.

Currently available IMDs, including ICDs and implantable pulsegenerators (IPGs), typically include a metallic housing that ishermetically sealed and, therefore, is impervious to body fluids, and aheader or connector assembly mounted to the housing for makingelectrical and mechanical connection with one or more leads. Suchdevices also possess telemetry capabilities for communicating withexternal devices. Over the past several years, IMDs have evolved fromrelatively bulky devices to complex miniaturized devices that exhibitincreasing functionality. For example, numerous improvements have beenmade in cardioversion/defibrillation leads and electrodes that haveenabled the cardioversion/defibrillation energy to be preciselydelivered to selected one or more portions of upper and lower heartchambers, thereby dramatically reducing the delivered shock energyrequired to cardiovert or defibrillate the heart chamber. High voltageoutput circuitry has also been improved to provide monophasic, biphasic,or multi-phase cardioversion/defibrillation shock or pulse waveforms,sometimes with particular combinations of cardioversion/defibrillationelectrodes, that are efficacious in lowering the required shock energyto cardiovert or defibrillate the heart.

The miniaturization of IMDs is driving size and cost reduction of allIMD components, including the electronic circuitry components, where itis desirable to increase the density and reduce the size of suchcomponents so that the overall circuitry can be more compact. As thedimensions of IMDs decrease, the electronic circuits of the IMD areformed as integrated circuits to fit within a minimal space.Furthermore, as the dimensions of the components are also being reduced,it is desirable to improve the use of the dimensions within the IMDpackage.

One response to this desire has been through technological improvementsto the packaging for the devices in which the output circuitry isincluded through such packaging techniques as reconstituted waferpackaging. In particular, development efforts in reconstituted waferpackaging, also known as fan out wafer level packaging, focus onproducing thinner and smaller electronic packages.

SUMMARY

In general, the present disclosure provides various embodiments of anintegrated circuit package and a method of forming such package. Theintegrated circuit package can include a substrate having a core layerdisposed between a first dielectric layer and a second dielectric layer,a die disposed in a cavity of the core layer, and an encapsulantdisposed in the cavity between the die and a sidewall of the cavity. Thepackage can also include a first patterned conductive layer disposedwithin the first dielectric layer and a device disposed on an outersurface of the first dielectric layer such that the first patternedconductive layer is between the device and the core layer, where thedevice is electrically connected to the die. The package can alsoinclude a second patterned conductive layer disposed within the seconddielectric layer and a conductive pad disposed on an outer surface ofthe second dielectric layer such that the second patterned conductivelayer is between the conductive pad and the core layer, where theconductive pad is electrically connected to the die.

In one aspect, the present disclosure provides an integrated circuitpackage that includes a substrate having a core layer disposed between afirst dielectric layer and a second dielectric layer, a die disposed ina cavity of the core layer, and an encapsulant disposed in the cavitybetween the die and a sidewall of the cavity. The integrated circuitpackage further includes a first patterned conductive layer disposedwithin the first dielectric layer; a device disposed on an outer surfaceof the first dielectric layer such that the first patterned conductivelayer is between the device and the core layer, where the device iselectrically connected to the die; a second patterned conductive layerdisposed within the second dielectric layer; and a conductive paddisposed on an outer surface of the second dielectric layer such thatthe second patterned conductive layer is between the conductive pad andthe core layer. The conductive pad is electrically connected to the die.

In another aspect, the present disclosure provides a method of formingan integrated circuit package. The method includes disposing a cavity ina core layer, disposing a carrier layer on the core layer over thecavity, and disposing a die within the cavity on the carrier layer. Themethod further includes disposing a first dielectric layer on the corelayer over the cavity such that the core layer is between the firstdielectric layer and the carrier layer, where the first dielectric layerincludes a first patterned conductive layer disposed between first andsecond sublayers of the first dielectric layer, and where the firstpatterned conductive layer includes a field plate that is spaced apartfrom the die; removing the carrier layer from the core layer; anddisposing a second dielectric layer on the core layer such that the corelayer is between the first and second dielectric layers. The seconddielectric layer includes a second patterned conductive layer disposedbetween first and second sublayers of the second dielectric layer.

All headings provided herein are for the convenience of the reader andshould not be used to limit the meaning of any text that follows theheading, unless so specified.

The terms “comprises” and variations thereof do not have a limitingmeaning where these terms appear in the description and claims. Suchterms will be understood to imply the inclusion of a stated step orelement or group of steps or elements but not the exclusion of any otherstep or element or group of steps or elements.

In this application, terms such as “a,” “an,” and “the” are not intendedto refer to only a singular entity but include the general class ofwhich a specific example may be used for illustration. The terms “a,”“an,” and “the” are used interchangeably with the term “at least one.”The phrases “at least one of” and “comprises at least one of” followedby a list refers to any one of the items in the list and any combinationof two or more items in the list.

The phrases “at least one of” and “comprises at least one of” followedby a list refers to any one of the items in the list and any combinationof two or more items in the list.

As used herein, the term “or” is generally employed in its usual senseincluding “and/or” unless the content clearly dictates otherwise.

The term “and/or” means one or all of the listed elements or acombination of any two or more of the listed elements.

As used herein in connection with a measured quantity, the term “about”refers to that variation in the measured quantity as would be expectedby the skilled artisan making the measurement and exercising a level ofcare commensurate with the objective of the measurement and theprecision of the measuring equipment used. Herein, “up to” a number(e.g., up to 50) includes the number (e.g., 50).

Also herein, the recitations of numerical ranges by endpoints includeall numbers subsumed within that range as well as the endpoints (e.g., 1to 5 includes 1, 1.5, 2, 2.75, 3, 3.80, 4, 5, etc.).

These and other aspects of the present disclosure will be apparent fromthe detailed description below. In no event, however, should the abovesummaries be construed as limitations on the claimed subject matter,which subject matter is defined solely by the attached claims, as may beamended during prosecution.

BRIEF DESCRIPTION OF THE DRAWINGS

Throughout the specification, reference is made to the appendeddrawings, where like reference numerals designate like elements, andwherein:

FIG. 1 is a schematic cross-section view of one embodiment of anintegrated circuit package.

FIG. 2 is a schematic top view of a major surface of a die of theintegrated circuit package of FIG. 1.

FIGS. 3A-I are various cross-section views of one embodiment of formingan integrated circuit package, where FIG. 3A is a schematiccross-section view of a core layer; FIG. 3B is a schematic cross-sectionview of a cavity disposed in the core layer; FIG. 3C is a schematiccross-section view of a carrier disposed on the core layer; FIG. 3D is aschematic cross-section view of a die disposed in the cavity of the corelayer; FIG. 3E is a schematic cross-section view of a first dielectriclayer disposed on the core layer over the cavity; FIG. 3F is a schematiccross-section view of the carrier removed from the core layer and asecond dielectric layer disposed on the core layer; FIG. 3G is aschematic cross-section view of a field plate disposed within the firstdielectric layer and a patterned conductive layer on an outer surface ofthe second dielectric layer; FIG. 3H is a schematic cross-section viewof a patterned conductive layer disposed on an outer surface of thefirst dielectric layer; and FIG. 31 is a schematic cross-section view ofconductive pads disposed on an outer surface of the second dielectriclayer.

FIG. 4 is as schematic plan view of one embodiment of an implantablemedical device that includes an integrated circuit package.

FIG. 5 is a schematic cross-section view of another embodiment of anintegrated circuit package.

DETAILED DESCRIPTION

In general, the present disclosure provides various embodiments of anintegrated circuit package and a method of forming such package. Theintegrated circuit package can include a substrate having a core layerdisposed between a first dielectric layer and a second dielectric layer,a die disposed in a cavity of the core layer, and an encapsulantdisposed in the cavity between the die and a sidewall of the cavity. Thepackage can also include a first patterned conductive layer disposedwithin the first dielectric layer and a device disposed on an outersurface of the first dielectric layer such that the first patternedconductive layer is between the device and the core layer, where thedevice is electrically connected to the die. The package can alsoinclude a second patterned conductive layer disposed within the seconddielectric layer and a conductive pad disposed on an outer surface ofthe second dielectric layer such that the second patterned conductivelayer is between the conductive pad and the core layer, where theconductive pad is electrically connected to the die.

Microelectronic elements, such as semiconductor chips or dies, aretypically flat bodies with electrical connection contacts disposed on anexterior surface, where the electrical connection contacts are connectedto the internal electrical circuitry of the element itself.Microelectronic elements are oftentimes packaged to form integratedcircuit packages, or assemblies, having a surface that is surfacemountable with terminals that electrically connect to the element'sinternal contacts. The package or assembly may then be connected to testequipment to determine whether the packaged device conforms to a desiredperformance standard. Once tested, the package may be connected to alarger circuit, e.g., a circuit in an electronic product such as animplantable medical device. The package or assembly for suchmicroelectronic elements may include the integrated circuit packagesdescribed herein.

One or more embodiments of integrated circuit packages may provide oneor more benefits over existing packages. For example, disposing one ormore dies in a cavity disposed in a core layer of an integrated circuitpackage can provide a reduction in size (i.e., height) of the packageover currently existing packages. Further, wire bonds may not berequired to connect the die to a patterned conductive layer of thepackage as the die can be a flip-chip die that is electrically connectedby one or more die contacts disposed on a top or bottom surface of thedie when the die is disposed within the cavity of the core layer.Various embodiments of methods for forming such packages describedherein can also provide for packaging of numerous dies and othercomponents in one process flow, thereby reducing the costs ofmanufacturing these integrated circuit packages. In one or moreembodiments, a parasitic inductance of an interconnect to the die of thepackage can be lower than that produced by wire bonds. This can allowthe die to operate at a higher frequency and can also reduce inductivevoltage spikes when switching high current. Further, the overallresistance of one or more embodiments of packages described herein canexhibit reduced resistive losses and increased current capability.Further, one or more packages described herein can include multiplecontacts of a die to be distributed over source and drain pads of thepackage. Such configurations can decrease current density in the die,increase maximum current capability, and reduce power loss. Suchconfigurations can also allow heat to be drawn from the die through twoor more sides of the package. Further, one or more embodiments ofpackages described herein can allow components and integrated circuitpackages to be stacked upon one another to form a three-dimensionalhigh-voltage stack structure.

The core layer can include any suitable material or materials. In one ormore embodiments, the core layer can be a glass core layer. Such glasscore layers can be manufactured using any suitable technique ortechniques. A glass core layer can provide improved dielectricproperties over other types of materials (e.g., silicon) that could beutilized for the core layer. Such improved dielectric properties canallow for one or more conductive layers to be disposed directly on thecore layer without requiring first disposing a dielectric layer bedisposed between the core layer and the patterned conductive layer.Further, one or more embodiments of glass core layers can exhibitimproved warpage resistance.

FIGS. 1-2 are various views of one embodiment of an integrated circuitpackage 10. The integrated circuit package 10 includes a substrate 12having a core layer 14 disposed between a first dielectric layer 16 anda second dielectric layer 18. One or more dies 20 are each disposed in acavity 22 of the core layer 14. Further, an encapsulant 24 is disposedin each cavity 22 between the respective die 20 and a sidewall 26 of thecavity. The package 10 also includes a first patterned conductive layer28 disposed within the first dielectric layer 16. One or more devices 30are disposed on an outer surface 32 of the first dielectric layer 16such that the first patterned conductive layer 28 is between the one ormore devices and the core layer 14. One or more of the devices 30 areelectrically connected to one or more of the dies 20. The package 10also includes a second patterned conductive layer 34 disposed within thesecond dielectric layer 18. In one or more embodiments, one or moreconductive pads 36 can be disposed on or in an outer surface 38 of thesecond dielectric layer 18 such that the second patterned conductivelayer 34 is between the conductive pads and the core layer 14. Further,in one or more embodiments, one or more of the conductive pads 36 can beelectrically connected to one or more of the dies 20 using any suitabletechnique or techniques as is further described herein.

The substrate 12 can include any suitable substrate. Further, thesubstrate 12 can include any suitable material or materials, e.g.,metallic, polymeric, or inorganic materials and combinations thereof. Inone or more embodiments, the substrate 12 can be a nonconductive ordielectric substrate that provides electrical isolation between variousconductors, vias, dies, etc. For convenience and without intending to belimiting, FIG. 1 depicts the substrate 12 as a monolithic (i.e., single)layer. In one or more embodiments, the substrate 12 can include anysuitable number of layers, where the layers can be formed from the sameor different materials. Further, the substrate 12 can have any suitabledimensions. For example, the substrate 12 can have any suitablethickness as measured in a direction orthogonal to the outer surface 32of the first dielectric layer 16. Further, the substrate 12 can beformed using any suitable technique or techniques.

In one or more embodiments, the substrate 12 includes the core layer 14disposed between the first dielectric layer 16 and the second dielectriclayer 18. The core layer 14 can include any suitable material ormaterials, e.g., the same materials described herein regarding thesubstrate 12. In one or more embodiments, the core layer 14 can includeone or more of glass, quartz, sapphire, FR4 (flame retardant 4),ceramic, etc. In one or more embodiments, the core layer 14 provides theentirety of the substrate 12. Further, in one or more embodiments, oneor more additional layers can be disposed on the core layer 14 to formthe substrate 12. For example, in one or more embodiments, one or morepattern conductive layers (not shown) can be disposed on one or bothsurfaces of the core layer 14 to provide the substrate 12.

The core layer 14 can include one or more cavities 22. The cavities 22can be formed in the core layer 14 using any suitable technique ortechniques. In one or more embodiments, one or more cavities 22 canextend completely through the core layer 14. Further, in one or moreembodiments, a depth or height of one or more cavities 22 as measured ina direction orthogonal to the outer surface 32 of the first dielectriclayer 16 can be less than a thickness of the core layer so that the suchcavities do not extend through the core layer 14. Each cavity 22 cantake any suitable shape or shapes in a plane parallel to the outersurface 32 of the first dielectric layer 16, e.g., elliptical,rectangular, polygonal, etc.

Each cavity 22 includes one or more sidewalls 24. Each sidewall 24 cantake any suitable shape or shapes in a plane orthogonal to the outersurface 32 of the first dielectric layer 16 (i.e., in the plane of FIG.1). In one or more embodiments, the sidewalls 24 can have a flat surfacethat is orthogonal to the outer surface 32 of the first dielectric layer16. In one or more embodiments, one or more sidewalls 24 can take atapered shape such that a cross-sectional area of the cavity 22 changesin a direction orthogonal to the outer surface 32 of the firstdielectric layer 16. Further, in one or more embodiments, one or moresidewalls 24 can include one or more curved portions.

The cavities 24 can have any suitable dimensions. In one or moreembodiments, at least one cavity 24 can have a width in a directionparallel to the outer surface 32 of the first dielectric layer 16 thatis greater than a width of the die 20 disposed in the cavity. In one ormore embodiments, a cavity 24 can have a width that is equal to a widthof the die 20 disposed therein such that the die is in contact with oneor more portions of the sidewall 24 of the cavity.

The first and second dielectric layers 16, 18 can include any suitablematerial or materials, e.g., polyimide, bismaleimide triazine,polybenzoxazole, photoresist, glass, quartz, sapphire, etc. In one ormore embodiments, at least one of the first and second dielectric layers16, 18 includes an electrically insulative material. Further, the firstand second dielectric layers 16, 18 can have any suitable dimensions. Inone or more embodiments, at least one of the first and second dielectriclayers 16, 18 can include two or more layers or sublayers, and eachsublayer can include the same or different materials. For example, thefirst dielectric layer 16 includes a first sublayer 48 and a secondsublayer 50. Further, the second dielectric layer 18 includes a firstsublayer 52 and a second sublayer 54. The first and second sublayers 48,50 of the first dielectric layer 16 can be disposed together using anysuitable technique or techniques. In one or more embodiments, the firstand second sublayers 48, 50 can be laminated together to form the firstdielectric layer 16. Similarly, the first and second sublayers 52, 54 ofthe second dielectric layer 18 can be disposed together using anysuitable technique or techniques. In one or more embodiments, the firstand second sublayers 52, 54 can be laminated together to form the seconddielectric layer 18. Although depicted as each including two sublayers,the first and second dielectric layers 16, 18 can each include anysuitable number of sublayers.

The first and second dielectric layers 16, 18 can be formed using anysuitable technique or techniques. In one or more embodiments, at leastone of the first and second dielectric layers 16, 18 can be formed onthe substrate 12. In one or more embodiments, at least one of the firstand second dielectric layers 16, 18 can be formed separately and thenconnected to the substrate 12, e.g., by laminating one or both of thefirst and second dielectric layers to the substrate.

As mentioned herein, the integrated circuit package 10 can include oneor more dies 20. Further, the package 10 can include any suitable numberof dies 20 disposed in any suitable arrangement or array. In one or moreembodiments, one or more dies 20 can be disposed in a cavity 22 of thecore layer 14. Although depicted as including one die 20 per cavity 22,in one or more embodiments, two or more dies can be disposed within asingle cavity. In one or more embodiments, one or more dies 20 can bedisposed in a cavity 22 such that the die is completely within thecavity. For example, each die 20 can have a die height measured in adirection orthogonal to the outer surface 32 of the first dielectriclayer 16 that is no greater than a height of the cavity 22 within whichthe die is disposed. In one or more embodiments, the die height of oneor more dies 20 can be greater than the height of the cavity 22 withinwhich the respective die is disposed.

The package 10 can include any suitable type of die or dies 20. In oneor more embodiments, the package 10 can include one or more high-voltagedies that can be utilized, e.g., in an implantable medical device (see,e.g., implantable medical device 200 of FIG. 4). As used herein, theterm “high-voltage die” refers to an electronic component or device thatis operable with a potential greater than about 50 V across any twoelectrical terminals or contacts of the component. Such high-voltagecomponents may be further operable at DC voltages greater than about 100V, and even further may be operable at DC voltages greater than about500 V, 1000 V, 1600 V, 3000 V and even greater, perhaps in the tens ofthousands or more volts. In one or more embodiments, the package 10 caninclude one or more low-voltage dies. In one or more embodiments, theone or more dies 20 can include one or more field effect transistors(FETs), metal oxide semiconductors (MOS), MOSFETs, insulated gatebipolar junction transistors (IGBT), thyristors, bipolar transistors,diodes, MOS-controlled thyristors, resistors, capacitors, etc. Althoughthe dies 20 of FIG. 1 are illustrated as being on the same plane, in oneor more embodiments, the dies may be arranged in a stacked relationship.

In one or more embodiments, one or more dies 20 can include a fieldtermination structure 40 (FIG. 2) disposed on a major surface 42 of thedie. In one or more embodiments, the major surface 42 faces a fieldplate 44 (FIG. 1) that can be electrically connected to at least one ofthe first patterned conductive layer 28, the second patterned conductivelayer 34, and a conductive pad 36 disposed on or in the outer surface 38of the second dielectric layer 18 as is further described herein.

The field termination structure 40 can include any suitable conductor orconductors manufactured using any suitable material or materials.Further, the field termination structure 40 can include any suitablestructure that is adapted to at least in part control propagation ofelectric fields within the die 20 to mitigate or prevent avalanchebreakdowns. For example, in one or more embodiments, the fieldtermination structure 40 can include a mesa-type structure. Suchbreakdowns can occur when a critical electric field for the material(e.g., silicon) of the die is exceeded. In one or more embodiments, thefield termination structure 40 can include one or more floating P-typerings in an N-type substrate. The P-type rings can occupy volume at theouter surface 42 of the die 20 and can cause the depletion region in theN-type material of the die to spread out farther across the surface ofthe die where the electric field can be at its greatest. A volumeoccupied by these P-type rings can force the depletion region in theN-type substrate of the die 20 to spread out over a larger area anddistance at the outer surface 42 and within the die (because chargebalance is required to be maintained for a main reverse-biased P-Njunction). These P-type rings can be spaced in a way to provide arelatively consistent electric field across the surface 42 and withinthe die 20. As shown in FIG. 2, the field termination structure 40 caninclude one or more rings that can be disposed in any suitable shape orpattern on the outer surface 42 of the die 20.

The dies 20 can be electrically connected to at least one of the firstpatterned conductive layer 28, the second patterned conductive layer 34,a third patterned conductive layer 46, and one or more conductive pads36 using any suitable technique or techniques. In one or moreembodiments, one or more vias 60 can be disposed through the firstsublayer 48 of the first dielectric layer 16 to electrically connect oneor more top contacts 21 of the die 20 to the first patterned conductivelayer 28. Further, in one or more embodiments, one or more vias 66 canbe disposed through the first sublayer 52 of the second dielectric layer18 to electrically connect one or more bottom contacts 23 of the die 20to the second patterned conductive layer 34.

Also disposed within one or more cavities 22 of the core layer 14 is theencapsulant 24. Encapsulant 24 can be disposed in any suitable portionor portions of the cavity 22. In one or more embodiments, theencapsulant 24 is disposed in the cavity 22 between the die 20 and oneor more portions of the sidewall 26 of the cavity. The encapsulant 24can include any suitable material or materials, e.g., UV curing type orheat curing type encapsulating materials, such as BCB,polybenzo-bisoxazole, epoxy, photoresist, and epoxy resins such as theSINR3170, siloxane resin, manufactured by Shin-Etsu Chemical Co., Ltd.,Japan, R4507 EMC (epoxy mold compound) manufactured by Nagase, G730 EMCmanufactured by Sumitomo, etc. Any suitable technique or techniques canbe utilized to dispose the encapsulant 24 within the cavity. In one ormore embodiments, a portion of the first dielectric layer 16 can formthe encapsulant 24 as is further described herein. The encapsulant 24can be adapted to at least partially encapsulate the die 20 within thecavity 22 such that the die remains in the cavity.

As mentioned herein, the encapsulant 24 can be disposed in the cavity 22between the die 20 and the sidewall 26 of the cavity using any suitabletechnique or techniques. In one or more embodiments, the encapsulant 24can include a portion of the first dielectric layer 16. For example, thedie 20 can be disposed within the cavity 22, and the first dielectriclayer 16 can be disposed on the core layer 14 (or substrate 12) by,e.g., laminating the first dielectric layer to the core layer. Duringthe lamination process, a portion of the first dielectric layer 16 canflow into the cavity 22 between the die 20 and the sidewall 26 of thecavity such that the portion at least partially encapsulates the diewithin the cavity. In one or more embodiments where the first dielectriclayer 16 includes sublayers, a portion or portions of the first sublayer48 that is disposed on the core layer (or substrate 12) can flow intothe cavity 22 to form the encapsulant 24.

Disposed within the first dielectric layer 16 is the first patternedconductive layer 28. The first dielectric layer 16 can include anysuitable number of patterned conductive layers disposed on or within thefirst dielectric layer. In one or more embodiments, the first dielectriclayer 16 can include the third patterned conductive layer 46 disposed onthe outer surface 32 of the first dielectric layer 16. Further, thefirst and third patterned conductive layers 28, 46 can include anysuitable type of conductive layer or layers, e.g., one or moreredistribution layers. The first and third patterned conductive layers28, 46 can be electrically connected to additional patterned conductivelayers, devices, conductive pads, etc. using one or more conductive vias47 that are disposed within the first dielectric layer 16. The first andthird patterned conductive layers 28, 46 can include any suitableconductive material or materials and be formed using any suitabletechnique or techniques as is further described herein. Further, thefirst and third patterned conductive layers 28, 46 can be disposedwithin or on the first dielectric layer 16 using any suitable techniqueor techniques.

The first patterned conductive layer 28 can be disposed in any suitablelocation within the first dielectric layer 16. In one or moreembodiments, the first patterned conductive layer 28 can be disposedbetween the first and second sublayers 48, 50 of the first dielectriclayer 16.

Further, the second patterned conductive layer 34 is disposed within thesecond dielectric layer 18. The second patterned conductive layer 34 caninclude any suitable patterned conductive layer, e.g., the samepatterned conductive layer described regarding the first patternedconductive layer 28. The second dielectric layer 18 can include anysuitable number of patterned conductive layers disposed within or on thesecond dielectric layer. In one or more embodiments, the secondpatterned conductive layer 34 can be disposed between the first andsecond sublayers 52, 54 of the second dielectric layer 18. The secondpatterned conductive layer 34 can be electrically connected to at leastone of the dies 20 by via 66, the first patterned conductive layer 28 byvias 47, the third patterned conductive layer 46 by vias 47, and one ormore conductive pads 36.

Disposed on the outer surface 32 of the first dielectric layer 16 areone or more devices 30. The integrated circuit package 10 can includeany suitable number of devices 30. Further, the integrated circuitpackage 10 can include any suitable devices, e.g., at least one of acapacitor, resistor, passive integrated capacitor system, logic circuit,analog circuit, etc. The one or more devices 30 can be disposed on theouter surface 32 of the first dielectric layer 16 such that the firstpatterned conductive layer 28 is between the devices and the core layer14.

One or more of the devices 30 can be electrically connected to one ormore of the dies 20 using any suitable technique or techniques. Forexample, in the embodiment illustrated in FIG. 1, a first device 30 aand a second device 30 b are electrically connected to the die 20 by thethird patterned conductive layer 46 and via 60 that is disposed throughthe first dielectric layer 16. The devices 30 a, 30 b can beelectrically connected to the third patterned conductive layer 46 usingany suitable technique or techniques. In one or more embodiments, one ormore device contacts 62 of a device 30 can be electrically connected tothe third patterned conductive layer 46. The device contacts 62 can bedisposed in any suitable location relative to the third patternedconductive layer 46. For example, in one or more embodiments, the devicecontacts 62 can be disposed between a device 30 and the third patternedconductive layer 46. In one or more embodiments, one or more devicecontacts 62 can be disposed on a top surface 64 of the device 30 andwire bonded to the third patterned conductive layer 46 (not shown).

Disposed on the outer surface 54 of the second dielectric layer 18 areone or more conductive pads 36. The conductive pads 36 can be disposedin any suitable location on or in the second dielectric layer 18.Further, the integrated circuit package 10 can include any suitablenumber of conductive pads 36. The conductive pads 36 can include anysuitable type of electrical connector, e.g., solder balls, solder,bumps, copper pillars, copper pillars with solder caps, conductivepolymers, compliant interconnects, etc. In one or more embodiments, theconductive pads 36 are disposed such that the second patternedconductive layer 34 is between the conductive pads and the core layer14. Further, in one or more embodiments, one or more conductive pads 36are electrically connected to one or more dies 30. For example, asillustrated in FIG. 1, conductive pad 36 is electrically connected todie 20 by the via 66 that extends from the second patterned conductivelayer 34 to the die. In one or more embodiments, one or more conductivepads 36 can be electrically connected to at least one of the secondpatterned conductive layer 34, one or more dies 20, the first patternedconductive layer 28, the third patterned conductive layer 46, and one ormore devices 30. Further, in one or more embodiments, one or moreconductive pads 36 can be electrically connected to one or more fieldplates 44 using any suitable technique or techniques.

The field plates 44 can be disposed on or within the integrated circuitpackage 10 in any suitable location. In the embodiment illustrated inFIG. 1, the field plates 44 are disposed within the first dielectriclayer 16 such that one or more of the field plates are spaced apart fromone or more of the dies 20. The field plates 44 can include a portion ofthe first patterned conductive layer 28 or be separate from the firstpatterned conductive layer. In one or more embodiments, one or more ofthe field plates 44 can be formed simultaneously with the firstpatterned conductive layer 28. The field plates 44 can include anysuitable field plates, e.g., the field plates described in U.S. Pat. No.8,664,756 to Boone et al.; entitled RECONSTITUTED WAFER PACKAGE WITHHIGH VOLTAGE DISCRETE ACTIVE DICE AND INTEGRATED FIELD PLATE FOR HIGHTEMPERATURE LEAKAGE CURRENT STABILITY.

In one or more embodiments, the field plate 44 is spaced from die 20 atan optimal spacing gap that is large enough to prevent dielectricbreakdown of the insulator but close enough to set up a strong enoughfield to dominate the system. The optimal distance for the spacing gapmay be determined based on the characteristics of the dielectricmaterial of first dielectric layer 16 and the test and/or operatingconditions for the die 20. In one or more embodiments, thecharacteristics that are taken into account may include the operatingconditions of package 10, including such things as the operating voltageand temperature regarding the breakdown characteristics for thedielectric material of the first dielectric layer 16. In one or moreembodiments, the distance of the spacing gap between field plate 44 andthe die 20 may alternatively or in addition be determined based on thedielectric strength of the material used for formation of the firstdielectric layer 16. In one or more embodiments, this spacing gap can beat least approximately 25 μm to no greater than approximately 300 μmdepending on the operating and/or test parameters for a given component.The controlling factor in the design and selection of a spacing gap isthat the field plate 44 will be effective up to the maximum breakdownstrength of the die 20 to prevent field effect leakage at roomtemperature and higher temperatures. As an example, a 1000 V MOSFETintended to operate at 80 percent rated voltage at 125° C. can havefield plate 44 spaced apart at a distance in the range of 50 to 200 μmfrom the field termination structure 40. As another example, a spacingof approximately 50 μm to approximately 75 μm can prevent dielectricbreakdown and ensure current stability for a die to be operated at 80percent of its rated 1600 V and up to 150° C. during a high temperatureleakage current test. As a result, for a given dielectric material, thehigher the voltage rating of the component or die the greater thespacing gap between the die 20 and field plate 44 is required to preventdielectric breakdown and ensure leakage current stability and eliminateor substantially prevent field effect leakage at room temperature.Further, positioning the field plate 44 within the first dielectriclayer 16 can permit the dimensions of the individual conductive pads 36to be determined independently of the spacing requirements for the fieldplate 44.

In one or more embodiments, at least a portion of the field plate 44overlaps the field termination structure 40 of the die 20 in a directionorthogonal to the outer surface 32 of the first dielectric layer 16. Inone or more embodiments, the field plate 44 substantially overlaps thefield termination structure 40, i.e., a majority of a surface area ofthe field plate overlaps with a majority of a surface area of the fieldtermination structure. As an illustration of the embodiments, theproportion including a majority may be 51%, or 75% or 85% or 98% or anyvariants within those percentages. In one or more embodiments, thesurface area of the field plate 44 may extend beyond the surface area ofthe field termination structure 40. In one or more embodiments, thefield plate 44 may be dimensioned to be substantially co-extensive witha surface area of the front-side face of the die 20. In one or moreembodiments, the dimensions of field plate 44 can be determined based onthe planar surface area of the field termination structure 40. As such,field plate 44 has a surface area that is at least the size of thesurface area of field termination structure 40. In one or moreembodiments, if there is a plurality of concentric field terminationstructures 40, field plate 44 can either be formed in a correspondingplurality of separate field plates each having a surface area of itsrespective field termination structure or as a single field plate with asurface area approximating that of the total annular ring that includesthe concentric termination rings. In embodiments where the surface areaof field plate 44 is dimensioned based on the size of the fieldtermination structure 40, the field plate surface area may becoextensive with the surface area of field termination structure and/ormay extend beyond the surface area of field termination structure.Additionally, the field plate 44 is aligned with or positioned directlyabove or in generally the same vertical plane as the field terminationstructure 40.

In one or more embodiments, the field plate 44 can be adapted to receivea biasing voltage to produce an electric field between die 20 and thefield plate. The biasing voltage can have a magnitude at least as greatas the magnitude of the biasing voltage applied to die 20, where thevoltages have the same polarity. For example, for a package 10 with anN-type substrate, a positive biasing voltage is applied to field plate44, and the positive biasing voltage can have a magnitude at least asgreat as the magnitude of the most positive biasing voltage applied todie 20. Similarly, for a package 10 having a p-type substrate, anegative biasing voltage is applied to field plate 44, and the negativebiasing voltage can have a magnitude at least as great as the magnitudeof the most negative biasing voltage applied to die 20. The field plate44 can be connected directly to a terminal of die 20 if the componenthas unidirectional blocking characteristics, such as MOSFETs and diodes.In one or more embodiments where the die 20 has bidirectional blocking,such as a thyristor, the voltage on field plate 44 can be switched. Ineither case, field plate 44 is biased with a polarity that promotesaccumulation of majority carriers at the surface of the lightly dopedsurface region at the field termination structure 40.

The field plate 44 can be electrically connected to one or more secondconductive pads 36 a that are disposed on the outer surface 38 of thesecond dielectric layer 18. The field plate 44 can be connected to thesecond conductive pads 36 a using any suitable technique or techniques.In one or more embodiments, the field plate 44 can be electricallyconnected to the second conductive pads 36 a by vias 47 that extendbetween the first dielectric layer 16 and the second dielectric layer18.

As mentioned herein, one or more embodiments of integrated circuitpackages can include a glass core layer. For example, FIG. 5 is aschematic cross-section view of another embodiment of an integratedcircuit package 300. All of the design considerations and possibilitiesregarding the integrated circuit package 10 of FIGS. 1-2 apply equallyto the integrated circuit package 300 of FIG. 5.

The package 300 includes a substrate 302 including a glass core layer304 that includes a first major surface 306, a second major surface 308,and a cavity 310 disposed between the first major surface and the secondmajor surface of the glass core layer. The package 300 further includesa die 312 disposed in the cavity 310 of the glass core layer 304, and anencapsulant 314 disposed in the cavity between the die and a sidewall316 of the cavity. A first patterned conductive layer 318 can bedisposed adjacent the first major surface 306 of the glass core layer304. As used herein, the term “adjacent the first major surface” meansthat an element or component is disposed closer to the first majorsurface 306 of the glass core layer 304 than to the second major surface308 of the glass core layer. The package 300 further includes a secondpatterned conductive layer 320 disposed adjacent the second majorsurface 308 of the glass core layer 304. As used herein, the term“adjacent the second major surface” means that an element or componentis disposed closer to the second major surface 308 of the glass corelayer 304 than to the first major surface 306 of the glass core layer.The package 300 also includes one or more conductive vias 322 disposedin the glass core layer 304 that extend between the first and secondmajor surfaces 306, 308 of the glass core layer. In one or moreembodiments, the conductive vias 322 can be electrically connected to atleast one of the first and second patterned conductive layers 318, 320.Further, the die 312 is electrically connected to at least one of thefirst and second patterned conductive layers 318, 320 using any suitabletechnique or techniques. In one or more embodiments, the die 312 iselectrically connected to each of the first and second patternedconductive layers 318, 320.

In one or more embodiments, the package 300 can include one or moredevices (not shown) disposed on at least one of the first and secondpatterned conductive layers 318, 320. Such device or devices can includeany suitable device, e.g., device 30 of package 10 of FIG. 1. The deviceor devices can be electrically connected to at least one of the firstand second patterned conductive layers 318, 320 using any suitabletechnique or techniques.

Disposed adjacent the first major surface 306 of the glass core layer304 is the first patterned conductive layer 318. In one or moreembodiments, the first patterned conductive layer 318 can be disposeddirectly on the first major surface 306 of the glass core layer 304. Inone or more embodiments, a dielectric layer 324 can be disposed betweenthe first patterned conductive layer 318 and the first major surface 306of the glass core layer 304. The dielectric layer 324 can include anysuitable dielectric layer or layers, e.g., first dielectric layer 16 ofpackage 10 of FIG. 1. The dielectric layer 324 can be disposed on thefirst major surface 306 of the glass core layer 304 using any suitabletechnique or techniques, e.g., the dielectric layer can be laminated tothe glass core layer.

Further, the second patterned conductive layer 320 can be disposeddirectly on the second major surface 318 of the glass core layer 304. Inone or more embodiments, a second dielectric layer (e.g., seconddielectric layer 18 of package 10) can be disposed between the secondpatterned conductive layer 320 and the second major surface 308 of theglass core layer 304. The second dielectric layer 320 can be disposed onthe second major surface 308 of the glass core layer 304 using anysuitable technique or techniques, e.g., the second dielectric layer canbe laminated to the glass core layer.

Disposed between the die 312 and the sidewall 316 of the cavity 310 isthe encapsulant 314. The encapsulant 314 can include any suitablematerial or materials that are adapted to encapsulate the die, e.g., thesame material or materials described herein regarding encapsulant 24 ofpackage 10 of FIG. 1. In one or more embodiments, the encapsulant 314can include a portion or portions of the dielectric layer 324 asdescribed herein regarding first dielectric layer 16 of package 10.

The die 312 disposed within the cavity 310 of the glass core layer 304can include any suitable device or circuit, e.g., the same devices orcircuits described herein regarding die 20 of package 10. In one or moreembodiments, the die 312 can include a high-voltage electricalcomponent. In one or more embodiments, the die 312 can include alow-voltage component.

Any suitable technique or techniques can be utilized to form theintegrated circuit package 10 of FIGS. 1-2 and the integrated circuitpackage 300 of FIG. 5. For example, FIGS. 3A-I are various schematiccross-section views of one embodiment of a method 100 of forming theintegrated circuit package 10. Although described in reference to theintegrated circuit package 10 of FIGS. 1-2, the method 100 can beutilized to form any suitable integrated circuit package. Further, themethod 100 is illustrated as including one die 20; however, the methodcan be utilized to form integrated circuit packages that include two ormore dies. In one or more embodiments, the method 100 can be utilized toform two or more integrated circuit packages 10 simultaneously utilizingone or more wafers.

In FIG. 3A, the core layer 14 is provided. In one or more embodiments,one or more additional layers can be disposed on one or both majorsurfaces of the core layer 14 to provide the substrate 12. One or morecavities 22 can be formed in the core layer 14 as shown in FIG. 3B usingany suitable technique or techniques, e.g., drilling, laser drilling,chemical etching, plasma etching, stamping, etc. Further, one or morevias 47 can be formed using any suitable technique or techniques. Forexample, in one or more embodiments, an opening can be formed using anysuitable technique or techniques, and a conductive material can bedisposed within the opening to form the conductive via 47. In one ormore embodiments, the vias 47 can be formed after the patternedconductive layers 28, 34, 46 (if included) have been formed.

In FIG. 3C, a carrier layer 102 can be disposed on a bottom surface 104of the core layer 14 and over the cavity 22. The carrier layer 102 caninclude any suitable carrier or transport. In one or more embodiments, asuitable release layer (not shown) can be disposed between the carrierlayer 102 and the bottom surface 104 of the core layer 14. Further, anoptional glass layer (not shown) can be disposed on the carrier layer102 such that the carrier layer is between the optional glass layer andthe core layer 14. Such optional glass layer can provide additionalsupport to the core layer 14 during processing of the integrated circuitpackage 10.

The die 20 can be disposed within the cavity 22 in FIG. 3D using anysuitable technique or techniques. In embodiments where the cavity 22extends completely through the core layer 14, the die 20 can be placeddirectly onto the carrier layer 102 or a release layer disposed on thecarrier layer.

In FIG. 3E, the first dielectric layer 16 can be disposed on the corelayer 14 and over the cavity 22 such that the core layer is between thefirst dielectric layer 16 and the carrier layer 102 using any suitabletechnique or techniques. In embodiments where the first dielectric layer16 includes sublayers, the first sublayer 48 can be disposed on the corelayer 16 as shown in FIG. 3E. In one or more embodiments, the firstsublayer 48 of the first dielectric layer 16 can be disposed on the corelayer 14 such that a portion or portions of the first sublayer flowsinto the cavity to provide encapsulant 24 between the sidewall 26 of thecavity and the die 20. In one or more embodiments, the first dielectriclayer 16 (or the first sublayer 48 of the first dielectric layer) can belaminated to the core layer 14.

The carrier layer 102 can be removed as shown in FIG. 3F using anysuitable technique or techniques. Further, the second dielectric layer18 can be disposed on the core layer 14 using any suitable technique ortechniques, e.g., the second dielectric layer or sublayers of the seconddielectric layer can be laminated onto the core layer. In embodimentswhere the second dielectric layer 18 includes two or more sublayers, thefirst sublayer 52 can be disposed on the core layer 14.

In FIG. 3G, the first patterned conductive layer 28 can be disposed onor within the first sublayer 48 of the first dielectric layer 16 usingany suitable technique or techniques. For example, in one or moreembodiments, a continuous conductive layer can be disposed on the firstsublayer 48, and the continuous conductive layer can then be patternedusing any suitable technique or techniques, e.g., photoresistapplication, photolithography, electroless plating, electroplating,chemical etching, dry etching, physical vapor deposition, etc. In one ormore embodiments, the field plate 44 can be disposed within the firstdielectric layer 16 using any suitable technique or techniques such thatthe field plate is spaced apart from the die 20. In one or moreembodiments, the first patterned conductive layer 28 can include thefield plate 44.

Further, the second patterned conductive layer 34 can be disposed on thefirst sublayer 52 of the second dielectric layer 18 using any suitabletechnique or techniques, e.g., the same techniques utilized to form thefirst patterned conductive layer 28. Prior to formation of the first andsecond patterned conductive layers 28, 34, one or more vias 60 can bedisposed through the first sublayer 48 such that the first patternedconductive layer 28 is electrically connected to the die 20. Further,one or more vias 66 can be formed through the first sublayer 52 of thesecond dielectric layer 18 such that the second patterned conductivelayer 34 is electrically connected to the die 20. Any suitable techniqueor techniques can be utilized to form the vias 60, 66. Further, vias 47can be extended through the first sublayer 48 of the first dielectriclayer 16 and electrically connected to the first patterned conductivelayer 28 using any suitable technique or techniques. Vias 47 can also beextended through the first sublayer 52 of the second dielectric layer 18using any suitable technique or techniques.

In FIG. 3H, the second sublayer 50 of the first dielectric layer 16 canbe disposed on the first patterned conductive layer 28 and the firstsublayer 48 using any suitable technique or techniques. In one or moreembodiments, the second sublayer 50 can be disposed over the entirefirst patterned conductive layer 28. The third patterned conductivelayer 46 can be disposed on the second sublayer 50 using any suitabletechnique or techniques, e.g., the same techniques utilized to form thefirst patterned conductive layer 28. Further, via 60 can be extendedthrough the first dielectric layer 16 between the outer surface 32 ofthe first dielectric layer and the die 20 using any suitable techniqueor techniques such that the die is electrically connected to the thirdpatterned conductive layer 46. In one or more embodiments, via 47 can beextended through the second sublayer 40 of the first dielectric layer 16such that the third patterned conductive layer 46 is electricallyconnected to the first and second patterned conductive layers 28, 34.

Further, as shown in FIG. 3H, the second sublayer 54 of the seconddielectric layer 18 can be disposed on the first sublayer 52 of thesecond dielectric layer using any suitable technique or techniques. Thesecond sublayer 54 can be disposed over one or more portions of thesecond patterned conductive layer 34 and the first sublayer 52 of thesecond dielectric layer 18. In one or more embodiments, the integratedcircuit package 10 does not include the second sublayer 54.

In FIG. 31, one or more conductive pads 36 can be disposed on or in thesecond dielectric layer 18 using any suitable technique or techniques.In one or more embodiments, one or more of the conductive pads 36 can beelectrically connected to at least one of the first patterned conductivelayer 28, the die 20, the second patterned conductive layer 34, thethird patterned conductive layer 46 and one or more devices 30 (FIG. 1).Although illustrated as being disposed at least partially within thesecond sublayer 54, the conductive pads 36 can be disposed on the outersurface 38 of the second sublayer.

The various embodiments of integrated circuit packages described hereincan be utilized in any suitable electronic system. For example, one ormore embodiments of integrated circuit packages described herein can beutilized in an IMD, ICD, IPG, insertable cardiac monitor, implantablediagnostic monitor, deep brain stimulator, implantable neurostimulator,injectable neurostimulator, implantable ventricular assist device, etc.FIG. 4 is a schematic plan view of one embodiment of an implantablemedical device (IMD) 200. The IMD 200 includes a housing 202 andelectronic components 204 disposed within the housing. The electroniccomponents 204 can include any suitable electronic devices, e.g., atleast one of a capacitor, resistor, passive integrated capacitor system,logic circuit, analog circuit, crystal, accelerometer, RF circuit,antenna, transformer, connector, etc. In one or more embodiments, theelectronic components 204 include an integrated circuit package 206. Thepackage 206 can include any suitable integrated circuit package, e.g.,integrated circuit package 10 of FIGS. 1-2 and package 300 of FIG. 5.The integrated circuit package 206 can be electrically connected toother electronic components 204 using any suitable technique ortechniques. Also disposed within the housing 202 of the IMD is a powersource 208 that is electrically connected to the electronic componentsusing any suitable technique or techniques. The power source can includeany suitable power source or combination of power sources, e.g., e.g.,one or more batteries, capacitors, inductive-coupled energy devices,photovoltaic devices, betavoltaic devices, alphavoltaic devices, andthermo-electric devices.

All references and publications cited herein are expressly incorporatedherein by reference in their entirety into this disclosure, except tothe extent they may directly contradict this disclosure. Illustrativeembodiments of this disclosure are discussed, and reference has beenmade to possible variations within the scope of this disclosure. Theseand other variations and modifications in the disclosure will beapparent to those skilled in the art without departing from the scope ofthe disclosure, and it should be understood that this disclosure is notlimited to the illustrative embodiments set forth herein. Accordingly,the disclosure is to be limited only by the claims provided below.

What is claimed is:
 1. An integrated circuit package, comprising: asubstrate comprising a core layer disposed between a first dielectriclayer and a second dielectric layer; a die disposed in a cavity of thecore layer; an encapsulant disposed in the cavity between the die and asidewall of the cavity; a first patterned conductive layer disposedwithin the first dielectric layer; a device disposed on an outer surfaceof the first dielectric layer such that the first patterned conductivelayer is between the device and the core layer, wherein the device iselectrically connected to the die; a second patterned conductive layerdisposed within the second dielectric layer; and a conductive paddisposed on an outer surface of the second dielectric layer such thatthe second patterned conductive layer is between the conductive pad andthe core layer, wherein the conductive pad is electrically connected tothe die.
 2. The package of claim 1, further comprising a field platedisposed within the first dielectric layer, wherein the field plate isspaced apart from the die.
 3. The package of claim 2, wherein the fieldplate is electrically connected to a second conductive pad disposed onthe outer surface of the second dielectric layer.
 4. The package ofclaim 2, wherein the die further comprises a field termination structuredisposed on an outer surface of the die that faces the field plate,wherein at least a portion of the field plate overlaps the fieldtermination structure in a direction orthogonal to the outer surface ofthe first dielectric layer.
 5. The package of claim 1, wherein the firstand second dielectric layers are laminated to the substrate.
 6. Thepackage of claim 1, wherein the encapsulant comprises a portion of thefirst dielectric layer.
 7. The package of claim 1, wherein the diecomprises a high voltage electrical component.
 8. The package of claim7, wherein the high voltage electrical component is operable with apotential of at least 500 volts.
 9. The package of claim 1, wherein thedie comprises at least one of a field effect transistor, a metal oxidesemiconductor field effect transistor, an insulated gate bipolarjunction transistor, a thyristor, a bipolar transistor, a diode, aMOS-controlled thyristor, a resistor, and a capacitor.
 10. The packageof claim 1, wherein each of the first and second dielectric layerscomprises two or more sublayers that are laminated together.
 11. Thepackage of claim 10, wherein the first patterned conductive layer isdisposed between two sublayers of the first dielectric layer.
 12. Thepackage of claim 10, wherein the second patterned conductive layer isdisposed between two sublayers of the second dielectric layer.
 13. Thepackage of claim 1, wherein the integrated circuit is incorporated in animplantable medical device.
 14. A method of forming an integratedcircuit package, comprising: disposing a cavity in a core layer;disposing a carrier layer on the core layer over the cavity; disposing adie within the cavity on the carrier layer; disposing a first dielectriclayer on the core layer over the cavity such that the core layer isbetween the first dielectric layer and the carrier layer, wherein thefirst dielectric layer comprises a first patterned conductive layerdisposed between first and second sublayers of the first dielectriclayer, wherein the first patterned conductive layer comprises a fieldplate that is spaced apart from the die; removing the carrier layer fromthe core layer; and disposing a second dielectric layer on the corelayer such that the core layer is between the first and seconddielectric layers, wherein the second dielectric layer comprises asecond patterned conductive layer disposed between first and secondsublayers of the second dielectric layer.
 15. The method of claim 14,wherein disposing the first dielectric layer on the core layer over thecavity comprises: disposing the first sublayer on the core layer;disposing the first patterned conductive layer on the first sublayer;and disposing the second sublayer on the first patterned conductivelayer and the first sublayer.
 16. The method of claim 15, whereindisposing the first dielectric layer on the core layer over the cavityfurther comprises disposing at least a portion of the first sublayerinto the cavity between the die and a sidewall of the cavity.
 17. Themethod of claim 14, further comprising: disposing a via through thefirst dielectric layer between an outer surface of the first dielectriclayer and the die, wherein the die is electrically connected to the via;and disposing a device on the outer surface of the first dielectriclayer such that it is electrically connected to the die by the via. 18.The method of claim 17, further comprising disposing a third patternedconductive layer on the outer surface of the first dielectric layer,wherein the device and the via are electrically connected to the thirdpatterned conductive layer.
 19. The method of claim 14, furthercomprising: disposing a second via through the second dielectric layerbetween an outer surface of the second dielectric layer and the die,wherein the die is electrically connected to the second via; anddisposing a conductive pad on the outer surface of the second dielectriclayer such that it is electrically connected to the die by the secondvia.
 20. The method of claim 14, wherein disposing the second dielectriclayer on the core layer over the cavity comprises: disposing the firstsublayer on the core layer; disposing the second patterned conductivelayer on the first sublayer; and disposing the second sublayer on thesecond patterned conductive layer and the first sublayer.